Wenfeng Zhang received the Ph.D. degree in materials science and engineering from City University of Hong Kong, Hong Kong, china, in 2009. Between 2009 and 2014, He worked as a postdoctoral research associate, JST-CREST project researcher and JSPS foreigner research fellow at the Center of Super-Diamond and Advanced Films (COSDAF) in City University of Hong Kong, Department of materials engineering in Tokyo University (Japan), respectively. He then joined the department of materials science and engineering, Huazhong University of Science and technology, as an associate professor. His research interests focus on the advanced semiconductor materials and devices for the post-silicon electronics, surface and interface science, high mobility channel CMOS devices etc. He has co-authored more than 50 academic journals/conference publications.
2009 Ph.D. in Department of Physics and Materials Science
City University of Hong Kong (CityU, Hong Kong)
2006 M.Phil. in Department of Materials Science and Engineering
The University of Science and Technology Beijing (USTB, Beijing, China)
2003 B.Eng. in Department of Materials Science and Engineering
Southwest Jiaotong University (SWJTU, Chengdu, China)